Block copolymer enables sub-8 nm line widths in semiconductor manufacturing
Tokyo, Japan (SPX) Sep 01, 2024
Scientists at Tokyo Institute of Technology (Tokyo Tech) and Tokyo Ohka Kogyo (TOK) have developed a novel block copolymer that could significantly enhance semiconductor miniaturization. This newly engineered polymer is capable of arranging itself into lamellar structures with a half-pitch width of just 7.6 nanometers, surpassing the capabilities of conventional block copolymers and pushing the
Scientists at Tokyo Institute of Technology (Tokyo Tech) and Tokyo Ohka Kogyo (TOK) have developed a novel block copolymer that could significantly enhance semiconductor miniaturization. This newly engineered polymer is capable of arranging itself into lamellar structures with a half-pitch width of just 7.6 nanometers, surpassing the capabilities of conventional block copolymers and pushing the
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